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Etching circuits using the anisotropic Ion Beam Milling system has long been considered a superior approach over the more haphazard Chemical Etching process which produces inconsistent results. Customers who require microwave circuits such as bandpass filters, Lange couplers, and other microstrip-type circuits that feature small, well defined metal lines and gap spacings are increasingly turning to Ion Beam Milling as a replacement for etching. This paper describes some focused experiments conducted recently to examine the degree of variation in the comparative performance of circuits manufactured using the Ion Beam Milling and Chemical Etching processes.
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